首页> 外国专利> METHOD OF MANUFACTURING ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE AND ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE BY THE METHOD

METHOD OF MANUFACTURING ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE AND ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE BY THE METHOD

机译:用该方法制造用于透明电极的基于zno的薄膜和用于透明电极的基于zno的薄膜

摘要

PURPOSE: A method of manufacturing a ZnO based thin film for a transparent electrode and a ZnO based thin film for a transparent electrode manufactured by the method are provided to obtain a ZnO based thin film with improved conductivity and transmittance in a long wavelength band. CONSTITUTION: A method of manufacturing a ZnO based thin film for a transparent electrode comprises the steps of: forming a ZnO film doped with dopant on a transparent substrate and rapidly heat-treating the ZnO thin film. The ZnO thin film is formed by selected one of pulse laser deposition, sputtering, spray coating, CVD coating, evaporation, and molecular beam epitaxy.
机译:用途:提供一种用于透明电极的基于ZnO的薄膜的制造方法以及通过该方法制造的用于透明电极的基于ZnO的薄膜,以得到在长波长带中具有改善的导电性和透射率的基于ZnO的薄膜。构成:一种用于透明电极的基于ZnO的薄膜的制造方法,包括以下步骤:在透明基板上形成掺杂有掺杂剂的ZnO薄膜,并对ZnO薄膜进行快速热处理。通过脉冲激光沉积,溅射,喷涂,CVD涂覆,蒸发和分子束外延中的一种来形成ZnO薄膜。

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