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METHOD OF MANUFACTURING ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE AND ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE BY THE METHOD
METHOD OF MANUFACTURING ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE AND ZNO BASED THIN FILM FOR TRANSPARENT ELECTRODE BY THE METHOD
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机译:用该方法制造用于透明电极的基于zno的薄膜和用于透明电极的基于zno的薄膜
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摘要
PURPOSE: A method of manufacturing a ZnO based thin film for a transparent electrode and a ZnO based thin film for a transparent electrode manufactured by the method are provided to obtain a ZnO based thin film with improved conductivity and transmittance in a long wavelength band. CONSTITUTION: A method of manufacturing a ZnO based thin film for a transparent electrode comprises the steps of: forming a ZnO film doped with dopant on a transparent substrate and rapidly heat-treating the ZnO thin film. The ZnO thin film is formed by selected one of pulse laser deposition, sputtering, spray coating, CVD coating, evaporation, and molecular beam epitaxy.
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