首页> 外国专利> METHOD OF FORMING ZTO THIN FILM PATTERN, A THIN FILM TRANSISTOR AND A MANUFACTURING METHOD THEREBY, CAPABLE OF SUPPRESSING A LEAKAGE CURRENT AND IMPROVING ELECTORAL PROPERTY

METHOD OF FORMING ZTO THIN FILM PATTERN, A THIN FILM TRANSISTOR AND A MANUFACTURING METHOD THEREBY, CAPABLE OF SUPPRESSING A LEAKAGE CURRENT AND IMPROVING ELECTORAL PROPERTY

机译:形成zto薄膜图案的方法,薄膜晶体管及其制造方法,其能够抑制泄漏电流并改善电子性能

摘要

PURPOSE: A method of forming ZTO thin film pattern, a thin film transistor and a manufacturing method thereby are provided to reduce manufacturing costs and a manufacturing time by improving productivity by etching a ZTO(Zinc Tin Oxide) film in rapid.;CONSTITUTION: In a method of forming ZTO thin film pattern, a thin film transistor and a manufacturing method thereby, a ZTO solution is spun-coated to form a ZTO thin film. The ZTO thin film is heat-treated in first. The treated ZTO thin film is patterned. The patterned ZTO thin film is heat-treated in second.;COPYRIGHT KIPO 2012
机译:目的:提供一种形成ZTO薄膜图案的方法,一种薄膜晶体管及其制造方法,以通过快速蚀刻ZTO(氧化锌锡)膜来提高生产率,从而降低制造成本和制造时间。在形成ZTO薄膜图案的方法,薄膜晶体管及其制造方法中,旋涂ZTO溶液以形成ZTO薄膜。首先对ZTO薄膜进行热处理。对处理过的ZTO薄膜进行构图。图案化的ZTO薄膜在第二秒内进行了热处理。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR101115074B1

    专利类型

  • 公开/公告日2012-03-13

    原文格式PDF

  • 申请/专利权人 PARK JAC KY;

    申请/专利号KR20100110825

  • 发明设计人 PARK JAC KY;

    申请日2010-11-09

  • 分类号H01L29/786;H01L21/324;H01L21/3063;G02F1/136;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:37

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