diamond substrate 10, a step of applying a resist (11) onto the coated resist ( 11) according to a predetermined arrangement rule to open the hole 12, and the wall (12b) of the hole 12 and the processing step is such that the reverse taper toward the inside from the opening (12a), the opening (12a) side inside the deposition mask 14, the step of forming a hole by depositing a mask material 12 from the resist 11 is deposited on the mask material 13, the resist 11 is lifted off together with the steps of, the method of forming the deposition mask 14, the diamond substrate by a mask 10 for etching the carbon-based carbonaceous material projection structure comprising a step of forming a projection material. ; is the projection tip portion smile according to the present invention, and the acute angle, a high aspect ratio of the projection, the substrate surface other than the projection is formed of a carbonaceous material projection structure to become flat projection method and the carbon-based material it is possible to provide a structure.
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