首页> 外国专利> PROCESSING CHAMBER FOR SUBSTRATE MANUFACTURE CAPABLE OF IMPROVING PRODUCTIVITY AND EFFECTIVENESS OF A SUBSTRATE FABRICATION PROCESS

PROCESSING CHAMBER FOR SUBSTRATE MANUFACTURE CAPABLE OF IMPROVING PRODUCTIVITY AND EFFECTIVENESS OF A SUBSTRATE FABRICATION PROCESS

机译:能够提高基板制造过程的生产率和效率的基板制造工艺室

摘要

PURPOSE: A processing chamber for substrate manufacture is provided to miniaturize the structure of the processing chamber for substrate manufacture by forming a rotation support plate as a thin disc shape having one or more ribs.;CONSTITUTION: A substrate support part(110) is located in the center of a processing chamber(100). The substrate support part supports a substrate(S). A first spraying nozzle part(120) includes a developer nozzle spray hole spraying a developer, and a stripping liquor nozzle spray hole spraying stripping liquor. The first spraying nozzle part is installed on one side of the substrate support part to be possible to move to a vertical direction. A second spraying nozzle part(130) comprises an etchant nozzle spray hole spraying an etchant, and a rinse liquid nozzle spray hole spraying a rinse liquid.;COPYRIGHT KIPO 2012
机译:目的:提供一种用于基板制造的处理腔室,以通过将旋转支撑板形成为具有一个或多个肋的薄盘形状来使用于基板制造的处理腔室的结构最小化;组成:基板支撑部分(110)位于在处理室(100)的中心。基板支撑部支撑基板。第一喷嘴部(120)包括:喷射显影剂的显影剂喷嘴喷射孔;以及喷射汽提液的汽提液喷嘴喷射孔。第一喷嘴部安装在基板支撑部的一侧,以能够沿垂直方向移动。第二喷嘴部分(130)包括:喷射蚀刻剂的蚀刻剂喷嘴喷射孔;以及喷射冲洗液的冲洗液喷嘴喷射孔。COPYRIGHTKIPO 2012

著录项

  • 公开/公告号KR101140376B1

    专利类型

  • 公开/公告日2012-05-03

    原文格式PDF

  • 申请/专利权人 3DPLUS;

    申请/专利号KR20110048236

  • 发明设计人 KIM GEUN JEONG;SON YEONG UNG;

    申请日2011-05-23

  • 分类号H01L21/302;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:12

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号