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STRUCTURES AND METHODS OF TRIMMING THRESHOLD VOLTAGE OF A FLASH EEPROM MEMORY

机译:修整闪存EEPROM存储器阈值电压的结构和方法

摘要

Multi -level - provides adjustments to the FET NVM cells in the cell (MLC) operation. The method includes the steps of: (a) each applied to the bulk of the first voltage and the second voltage control gate and repeat programmed FET NVM cell , (b) repeating the programmed FET NVM for a period of time to produce a threshold voltage reduction limited a step of applying a predetermined signal to the drain of the cell, the polarity of the first voltage and the second voltage is opposite to the polarity of the signal . Thus, the accumulation of charge in the electricity storage material is accurately controlled within a range of charge states of a multi- high density digital storage - can form the bit / cell ;
机译:多级-在单元(MLC)操作中提供对FET NVM单元的调整。该方法包括以下步骤:(a)分别施加到大部分第一电压和第二电压控制栅极并重复编程的FET NVM单元,(b)在一段时间内重复编程的FET NVM以产生阈值电压减小限制了将预定信号施加到单元的漏极的步骤,第一电压和第二电压的极性与信号的极性相反。因此,在多高密度数字存储器的电荷状态范围内,可以精确地控制蓄电材料中电荷的积累,从而可以形成位/单元。

著录项

  • 公开/公告号KR101168125B1

    专利类型

  • 公开/公告日2012-07-24

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20100088777

  • 发明设计人 왕 리 제트;후앙 주이-훙;

    申请日2010-09-10

  • 分类号G11C16/34;G11C16/12;G11C16/30;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:43

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