首页> 外国专利> MONOLITHIC VERTICAL JUNCTION FIELD EFFECT TRANSISTOR AND SCHOTTKY BARRIER DIODE FABRICATED FROM SILICON CARBIDE AND METHOD FOR FABRICATING THE SAME

MONOLITHIC VERTICAL JUNCTION FIELD EFFECT TRANSISTOR AND SCHOTTKY BARRIER DIODE FABRICATED FROM SILICON CARBIDE AND METHOD FOR FABRICATING THE SAME

机译:碳化硅制成的单分子垂直结场效应晶体管和肖特基势垒二极管及其制造方法

摘要

etch- self with the injection gate- aligned vertical junction field-effect transistors and integrated anti-parallel Schottky barrier a switching device that combines a diode is disclosed. The anode of the diode is connected to the source of the transistor at the device level in order to reduce the loss caused by the stray inductance . SiC surface in the SBD anode region is controlled through the dry etching so as to achieve a low Schottky barrier height to reduce the power loss associated with turn-on voltage of the SBD.
机译:利用注入栅极对准的垂直结场效应晶体管和集成的反平行肖特基势垒的自蚀刻,公开了结合二极管的开关器件。二极管的阳极在器件级连接到晶体管的源极,以减少由杂散电感引起的损耗。通过干蚀刻控制SBD阳极区域中的SiC表面,以实现低肖特基势垒高度,以减少与SBD的接通电压相关的功率损耗。

著录项

  • 公开/公告号KR101187084B1

    专利类型

  • 公开/公告日2012-09-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20077003004

  • 申请日2005-07-08

  • 分类号H01L29/78;H01L29/872;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:24

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号