首页> 外文期刊>工程与科学中的计算机建模(英文) >Suppression of Ambipolar Conduction in Schottky Barrier Carbon Nanotube Field Effect Transistors:Modeling,Optimization Using Particle Swarm Intelligence,and Fabrication
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Suppression of Ambipolar Conduction in Schottky Barrier Carbon Nanotube Field Effect Transistors:Modeling,Optimization Using Particle Swarm Intelligence,and Fabrication

机译:舒张在肖特基屏障碳纳米管场效应晶体管中的余渣传导:建模,粒子群智能优化,以及制造

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A mathematical model and experimental analysis of the impact of oxide thickness on the ambipolar conduction in Schottky Barrier Carbon Nanotubes(CNTs)Field Effect Transistor(SB CNTFETs)is presented.Suppression of ambipolar conduction in SB CNTFETs is imperative in order to establish them as the future of IC technology.The ambipolar nature of SB CNTFETs leads to a great amount of leakage current.Employing a gate oxide dielectric of thickness,tox~50 nm suppresses the ambipolar behavior.In an SB CNTFET,it is the electric field at the source/drain contacts that control the conductance and the band bending length at the contacts is defined by tox.Therefore,tox is the prime parameter that influences the width of the Schottky barrier and the current in the subthreshold region.Due to the wide SB,there is a loss in on-current due to tunneling,but the current due to thermionic emission is increased by employing a high-κdielectric such as Zirconium dioxide(ZrO2).This work proposes an approach to suppress ambipolar behavior in SB CNTFETs without decreasing the on current.The thickness and dielectric constant of the gate oxide are optimized using the particle swarm optimization(PSO)algorithm to achieve suppression of ambipolar conduction without any loss in on-current.The proposed SB CNTFET was modeled using Verilog-A.Experimental demonstration of the suppression of ambipolar property is also presented.Two SB CNTFETs are fabricated using high-κdielectric such as ZrO2 with different thickness.A device with thin(~5 nm)gate oxide and another device with thick(~50 nm)gate oxide were fabricated.From the experimental results,it is observed that the device with the thin gate oxide exhibited ambipolar characteristics and the device with the thick gate oxide did not exhibit ambipolar characteristics.The increase in thickness,tox,ensures suppression of ambipolar behavior.
机译:介绍了氧化物厚度对肖特基屏障碳纳米管(CNT)场效应晶体管(Sb CNTFET)的氧化物厚度对氧化物厚度的影响的数学模型和实验分析。SB CNTFET中的Ambipolar传导抑制是必要的,以便建立它们IC技术的未来。Sb CNTFET的Ambolar性质导致大量泄漏电流。施加栅极厚度的栅极介电,TOX〜50nm抑制了Ambolar行为。在SB CNTFET中,它是源的电场/漏极触点控制触点处的电导和带弯曲长度的触点由tox定义。因此,Tox是影响肖特基势垒的宽度和亚阈值区域中的电流的主要参数。在那里到宽的SB。由于隧道引起的电流损失,但是通过采用高κdIeLelit,例如二氧化锆(ZrO2),增加了由于热离子的电流。这项工作提出了一种方法在SB CNTFET中抑制AMIPOLAR行为而不降低电流。使用粒子群优化(PSO)算法优化栅极氧化物的厚度和介电常数,以抑制抑制Ampolar传导,而无任何损失。所提出的SB CNTFET使用Verilog-A模型建模。还介绍了抑制Ambipolar属性的实验说明。使用具有不同厚度的高κdie电,如ZrO2制造了两种Sb CNTFET.A具有薄(〜5nm)栅极氧化物的装置和另一个装置制造厚(〜50nm)栅极氧化物。从实验结果中,观察到具有薄栅极氧化物的装置表现出粗栅氧化物的胚轴特性,并且具有厚栅氧化物的装置没有表现出非磁性特性。厚度增加,玉米厚度增加,确保抑制Ampolar行为。

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