An illumination system for the illumination of a predetermined illumination field of a detectable with a euv - radiation

摘要

An illumination system (1) for the illumination of a predetermined illumination field (2) the surface of an object (3) with euv - radiation (5)– with a collector (9), said from a source (8) - euv radiation emitted by means of reflection (5) in the direction of an optical axis (7), along which the euv - radiation (5) by subsequent optical elements (10, 11, 13, 14, 15; 10, 11, 15; 10, 11, 13, 15) is guided, focuses,– with a first optical element (10) in order to generate secondary light sources (11a) in the illumination system (1),– with a second optical element (11) at the location of the from the first optical element (10) generated secondary light sources (11a), comprising the from the first optical element (10) reflected euv - radiation (5) along the optical axis (7) and the first optical element (10) into a with the object surface (3) coincides with, the image plane (4a) in the illumination field (2), wherein– between the collector (9) and the illuminated field (2) a maximum of five reflecting optical elements..