Illumination field parameters measurement for lithographic illumination subsystem

摘要

To measure the knife-edge penumbra optical parameters in ArF lithography illumination subsystem accurately, a technique based on the pupil image is proposed. A pupil image detection system is designed and built. The knife-edge penumbra optical parameters and illumination field feature parameters of an ArF lithography illumination subsystem were measured. The experimental results show that, compared with the conventional spot sensor scanning method, the proposed method improves the repeatability effectively. This technique can be applied to measure the parameters of high NA immersion lithography tool illumination subsystem.