Illumination optics for a metrology system for the investigation of an object with euv - illumination light, as well as metrology system with such an illumination optics

摘要

A metrology system (2) is used for the examination of a in an object field (3) arranged object (5) with euv - illumination light (1). An illumination optics (9) of the metrology system (2) has a in the beam path directly after a euv - light source (6) arranged collector mirrors (b1). This, in the beam path between the collector mirrors (b1) and the object field (3) is less than three further illuminating mirrors (b2, b3) is arranged downstream. In the beam path between the collector mirrors (b1) and the further illuminating mirrors (b2) is arranged an intermediate focus (11). For the metrology system (2) includes, furthermore, enlarging imaging optical system (15) in order to image the field of the object (3) in an image field (13) in an image plane (14). The result is a metrology system with a lens system, with which an efficient illumination of the object field with well to the lighting situation current euv - projection exposure apparatus adapted lighting parameters is ensured.