Illumination optics for a metrology system for the investigation of an object with euv lighting light as well as metrology system with such an illumination optics

摘要

Illumination optics (9) for a metrology system (2) for the investigation of a in an object field (3), an object (5) with euv lighting light (1),– with a in the beam path directly after a euv light source (6), which can be arranged collector mirrors (b1),– with less than three the collector mirrors (b1) in the beam path between the collector mirrors (b1) and the object field (3) downstream further lighting levels (b2, b3),– in the beam path between the collector mirrors (b1) and the first further illuminating mirrors (b2) is an intermediate focus (11) is arranged,– characterized by a setting aperture (12) in the beam path between the intermediate focus (11) and the first further illuminating mirrors (b2) according to the collector mirrors (b1), wherein the setting aperture (12) for predefining a maximum illuminating angle is used for the object field illumination.