ILLUMINATION OPTICS AND IMAGING OPTICS FOR A METROLOGY SYSTEM FOR THE INSPECTION OF AN OBJECT WITH EUV ILLUMINATION AND IMAGING LIGHT AND METROLOGY SYSTEM WITH SUCH ILLUMINATION OPTICS AND SUCH IMAGING OPTICS

摘要

a metrologiesystem (2) is used for investigation of an object (5) teu - lighting and abbildungslicht (1). an illumination (7) for the metrologiesystem (2), a beam to the object (5) of the illumination aperture (11) to randseitigen limit a set of beleuchtungslichts (1).the illumination aperture (11) in a blendenebene (xy) in two mutually perpendicular directions, two from each other by at least 10%, both blendendurchmesser. an imaging optical system (13), a beam to the object (5) ordered lists of aperture (15) to a set of randseitigen limit abbildungslichts (1).the lists of aperture (15) in a blendenebene (xy) in two mutually perpendicular directions, two from each other by at least 10%, both blendendurchmesser (bx, by.it is a metrologiesystem whose optics to the anamorphotischen projektionsbelichtung to manufacture semiconductor devices present lighting and abbildungsverhu00e4ltnisse are adapted.