首页> 外国专利> Device useful for treating substances in gas stream, preferably for absorption or filtering of gases, comprises first outer chamber, second inner chamber, and annular treatment chambers lying between first and second chambers

Device useful for treating substances in gas stream, preferably for absorption or filtering of gases, comprises first outer chamber, second inner chamber, and annular treatment chambers lying between first and second chambers

机译:用于处理气流中的物质(优选用于吸收或过滤气体)的设备包括第一外部腔室,第二内部腔室以及位于第一腔室和第二腔室之间的环形处理腔室

摘要

Device for treating substances in a gas stream, preferably for absorption and/or adsorption or filtering of gases, comprises: a first outer chamber (6) for supplying gas; a second inner chamber (7) for discharging the gas; and many annular treatment chambers lying between the first and second chambers and arranged above one another in the direction an axis. The annular treatment chambers (5) are bounded by walls against each other and against the first and second chamber and respectively comprises at least one upper inlet opening (13) and at least one lower outlet opening. Device for treating substances in a gas stream, preferably for absorption and/or adsorption or filtering of gases, comprises: a first outer chamber (6) for supplying gas; a second inner chamber (7) for discharging the gas; and many annular treatment chambers lying between the first and second chambers and arranged above one another in the direction an axis. The annular treatment chambers (5) are bounded by walls against each other and against the first and second chamber and respectively comprises at least one upper inlet opening (13) for a treatment medium comprising solid particles in the upper part and at least one lower outlet opening for the treatment medium in the lower part. Each treatment chamber supplies fresh, purified and/or recycled treatment medium at the upper inlet opening via a channel (14). A discharge device for removing the treatment medium is provided at the lower outlet opening of the treatment chamber, which is opening into the first chamber. The treatment chamber is connected with the first chamber for a gas inlet and with the second chamber for a gas outlet. The wall of the first chamber and the wall of the second chamber are fixed. The treatment chamber or the walls bounding this treatment chamber are arranged on the outer wall of the inner chamber. The discharge device are a part of a mounted and rotationally driven rotor-like unit, which is rotatable around the axis and is arranged in the vicinity of the wall of the outer chamber.
机译:用于处理气流中的物质的装置,优选地用于吸收和/或吸附或过滤气体的装置,包括:第一外部腔室(6),用于供应气体;第二内腔(7),用于排放气体。在第一腔室和第二腔室之间并且沿轴线方向彼此上方布置的许多环形处理腔室。环形处理腔室(5)由壁彼此相对以及分别抵靠第一腔室和第二腔室界定,并且分别包括至少一个上部入口(13)和至少一个下部出口。用于处理气流中的物质的设备,优选地用于吸收和/或吸附或过滤气体的设备,包括:第一外部腔室(6),用于供应气体;第二内腔(7),用于排放气体。在第一腔室和第二腔室之间并且沿轴线方向彼此上方布置的许多环形处理腔室。环形处理腔室(5)由壁彼此相对以及分别抵靠第一腔室和第二腔室界定,并且分别包括用于处理介质的至少一个上部入口(13),所述上部在上部和至少一个下部出口中包含固体颗粒。下部的处理介质开口。每个处理腔室通过通道(14)在上部入口开口处供应新鲜的,纯化的和/或再循环的处理介质。用于去除处理介质的排放装置设置在处理室的下部出口处,该下部开口通向第一室。处理室与用于进气的第一室和用于排气的第二室连接。第一腔室的壁和第二腔室的壁是固定的。处理腔室或界定该处理腔室的壁布置在内腔的外壁上。排出装置是安装并旋转驱动的转子状单元的一部分,该转子状单元可绕轴线旋转并且布置在外室的壁的附近。

著录项

  • 公开/公告号DE102010047481A1

    专利类型

  • 公开/公告日2012-06-14

    原文格式PDF

  • 申请/专利权人 SGASLIK FRITZ;

    申请/专利号DE20101047481

  • 发明设计人 SGASLIK FRITZ;

    申请日2010-10-06

  • 分类号B01D53/08;B01D53/14;B01J8/02;B01J8/12;

  • 国家 DE

  • 入库时间 2022-08-21 17:05:19

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