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Device useful for treating substances in gas stream, preferably for absorption or filtering of gases, comprises first outer chamber, second inner chamber, and annular treatment chambers lying between first and second chambers
Device useful for treating substances in gas stream, preferably for absorption or filtering of gases, comprises first outer chamber, second inner chamber, and annular treatment chambers lying between first and second chambers
Device for treating substances in a gas stream, preferably for absorption and/or adsorption or filtering of gases, comprises: a first outer chamber (6) for supplying gas; a second inner chamber (7) for discharging the gas; and many annular treatment chambers lying between the first and second chambers and arranged above one another in the direction an axis. The annular treatment chambers (5) are bounded by walls against each other and against the first and second chamber and respectively comprises at least one upper inlet opening (13) and at least one lower outlet opening. Device for treating substances in a gas stream, preferably for absorption and/or adsorption or filtering of gases, comprises: a first outer chamber (6) for supplying gas; a second inner chamber (7) for discharging the gas; and many annular treatment chambers lying between the first and second chambers and arranged above one another in the direction an axis. The annular treatment chambers (5) are bounded by walls against each other and against the first and second chamber and respectively comprises at least one upper inlet opening (13) for a treatment medium comprising solid particles in the upper part and at least one lower outlet opening for the treatment medium in the lower part. Each treatment chamber supplies fresh, purified and/or recycled treatment medium at the upper inlet opening via a channel (14). A discharge device for removing the treatment medium is provided at the lower outlet opening of the treatment chamber, which is opening into the first chamber. The treatment chamber is connected with the first chamber for a gas inlet and with the second chamber for a gas outlet. The wall of the first chamber and the wall of the second chamber are fixed. The treatment chamber or the walls bounding this treatment chamber are arranged on the outer wall of the inner chamber. The discharge device are a part of a mounted and rotationally driven rotor-like unit, which is rotatable around the axis and is arranged in the vicinity of the wall of the outer chamber.
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