首页> 外国专利> EVALUATION METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND MANUFACTURING METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING THE EVALUATION METHOD

EVALUATION METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND MANUFACTURING METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING THE EVALUATION METHOD

机译:半导体光刻技术的聚合物评价方法及包括该评价方法的半导体光刻技术的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a method capable of evaluating solubility of a polymer for lithography to a solvent simply with high accuracy.SOLUTION: An evaluation method of a polymer for semiconductor lithography includes the following steps of: (1) preparing a test solution containing a polymer for semiconductor lithography, a good solvent of the polymer, and a poor solvent of the polymer; and (2) measuring turbidity or transmittance of the test solution. The measurement of turbidity or transmittance is performed by using a sealed or substantially sealed measurement container.
机译:解决的问题:提供一种能够简单,高精度地评价光刻用聚合物对溶剂的溶解性的方法。解决方案:半导体光刻用聚合物的评价方法包括以下步骤:(1)准备测试溶液。包含用于半导体光刻的聚合物,该聚合物的良溶剂和该聚合物的不良溶剂; (2)测量测试溶液的浊度或透射率。浊度或透射率的测量通过使用密封的或基本密封的测量容器来进行。

著录项

  • 公开/公告号JP2013214032A

    专利类型

  • 公开/公告日2013-10-17

    原文格式PDF

  • 申请/专利权人 MITSUBISHI RAYON CO LTD;

    申请/专利号JP20120189670

  • 发明设计人 NAKAJO MIHO;MAEDA SHINICHI;KATO KEISUKE;

    申请日2012-08-30

  • 分类号G03F7/26;H01L21/027;C08F20/28;G03F7/039;

  • 国家 JP

  • 入库时间 2022-08-21 17:02:28

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