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EVALUATION METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND MANUFACTURING METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING THE EVALUATION METHOD
EVALUATION METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND MANUFACTURING METHOD OF POLYMER FOR SEMICONDUCTOR LITHOGRAPHY INCLUDING THE EVALUATION METHOD
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机译:半导体光刻技术的聚合物评价方法及包括该评价方法的半导体光刻技术的制备方法
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摘要
PROBLEM TO BE SOLVED: To provide a method capable of evaluating solubility of a polymer for lithography to a solvent simply with high accuracy.SOLUTION: An evaluation method of a polymer for semiconductor lithography includes the following steps of: (1) preparing a test solution containing a polymer for semiconductor lithography, a good solvent of the polymer, and a poor solvent of the polymer; and (2) measuring turbidity or transmittance of the test solution. The measurement of turbidity or transmittance is performed by using a sealed or substantially sealed measurement container.
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