首页> 外国专利> PRODUCTION METHOD FOR NITRIDE SEMICONDUCTOR CRYSTAL OF GROUP 13 METAL OF PERIODIC TABLE, AND NITRIDE SEMICONDUCTOR CRYSTAL OF GROUP 13 METAL OF PERIODIC TABLE OBTAINED BY THE PRODUCTION METHOD

PRODUCTION METHOD FOR NITRIDE SEMICONDUCTOR CRYSTAL OF GROUP 13 METAL OF PERIODIC TABLE, AND NITRIDE SEMICONDUCTOR CRYSTAL OF GROUP 13 METAL OF PERIODIC TABLE OBTAINED BY THE PRODUCTION METHOD

机译:周期表第13族金属的氮化物晶体的生产方法,以及采用该方法获得的周期表第13族金属的氮化物晶体的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a nitride semiconductor crystal in which the warpage amount of crystal axis in the plane is suppressed.;SOLUTION: A nitride semiconductor crystal of a group 13 metal of the periodic table is grown so that a growth surface has a facet structure, and then the nitride semiconductor crystal of the group 13 metal of the periodic table is grown so as to bury the facet structure by setting the partial pressure of nitrogen gas to 6.5×104 Pa or more. In the growth process, after growing the nitride semiconductor crystal of the group 13 metal of the periodic table so that the growth surface has the facet structure, the nitride semiconductor crystal of the group 13 metal of the periodic table may be grown so as to continuously bury the facet structure.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种用于制造氮化物半导体晶体的方法,其中抑制了平面内晶轴的翘曲量。解决方案:生长元素周期表中第13族金属的氮化物半导体晶体,使得生长表面具有小平面结构,然后通过将氮气分压设置为6.5×10 4 Pa或更高。在生长过程中,在使元素周期表的第13族金属的氮化物半导体晶体生长以使生长表面具有小面结构之后,可以使元素周期表的第13族金属的氮化物半导体晶体连续生长。掩埋刻面结构。;版权所有:(C)2014,JPO&INPIT

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