MULTI-LEVEL GRADATION PHOTOMASK, METHOD FOR MANUFACTURING MULTI-LEVEL GRADATION PHOTOMASK, PATTERN TRANSFER METHOD, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To suppress the exposure of a resist film on an object to be machined in an area isolated from a boundary with a translucent part or a semi-translucent part in a light shading part in a multi-level gradation photomask in which the light shading part has predetermined light permeability in order to generate phase shift effects.SOLUTION: In a multi-level gradation photomask with a pattern for transfer including a translucent part, a light shading part, and a semi-translucent part formed by patterning an optical film formed on a transparent substrate for forming a resist pattern having a plurality of different residual film values on an object to be machined. The optical film has an action to shift the phase of a representative wavelength included in exposure rays of light of the multi-level gradation photomask by about 180 degrees, and has a permeability of 3% to 50% with respect to the rays of light having the representative wavelength. As for the translucent part and the semi-translucent part, a part of the surface of the transparent substrate is exposed, and the light shading part has a fine transmission pattern having a line width not resolving under the exposure conditions of the multi-level gradation photomask.