FLUORIDE AND FLUORINE-DOPED OXIDE THIN FILM MADE BY REACTIVE SPUTTERING METHOD USING PURE METAL TARGET

摘要

PROBLEM TO BE SOLVED: To provide a fluoride and fluorine-doped oxide thin film made by a reactive sputtering method using a pure metal target.;SOLUTION: A deep ultraviolet light plating film 4 includes a fluorine-doped oxide metal thin film of high refractive index and a fluoride metal thin film of low refractive index, which are made by the reactive sputtering method using a pure metal target material 2. In the fluorine-doped oxide metal thin film, metal atoms flicked out of the target material 2 are bonded with oxygen gas to form a metal oxide, and the metal oxide is reacted with fluorine (F) ions and fluorine (F) excited atoms flicked out of gas containing fluorine, and deposited to form the fluorine-doped oxide metal thin film. Further, in the fluoride metal thin film, fluorine (F) ions and fluorine (F) excited atoms flicked out by exciting the gas containing fluorine are collided with the target material to flick out the metal atoms, and reacted with the metal atoms flicked out in the collision, and deposited to form the fluoride metal thin film.;COPYRIGHT: (C)2013,JPO&INPIT