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REACTIVE SPUTTERING APPARATUS CAPABLE OF DEPOSITING METAL OXIDES AT HIGH SPEED BY INSTALLING SEPARATION PLATE BETWEEN SPUTTERING TARGET AND SUBSTRATE AND REACTIVE SPUTTERING METHOD USING THE SAME
REACTIVE SPUTTERING APPARATUS CAPABLE OF DEPOSITING METAL OXIDES AT HIGH SPEED BY INSTALLING SEPARATION PLATE BETWEEN SPUTTERING TARGET AND SUBSTRATE AND REACTIVE SPUTTERING METHOD USING THE SAME
PURPOSE: To provide a reactive sputtering deposition apparatus and method that deposit a metal oxide thin film on the substrate at high speed by installing a separation plate between a sputtering target and a substrate and promote oxidation of a metal target material deposited on the substrate and prevent oxidation of the metal target by injecting reactive gas near the substrate and injecting sputtering gas near the target. CONSTITUTION: The reactive sputtering deposition apparatus(10) comprises a deposition chamber(11) for forming a process atmosphere in the apparatus; a target(12) equipped with a metal material to be deposited on the substrate; a substrate(13) on which the metal material is deposited by reacting the metal material separated from the target with a reactive gas; and a separation plate(14) formed between the target and the substrate to divide the deposition chamber into a reaction chamber(11a) of the substrate side and a sputtering chamber(11b) of the target side, wherein a hole is formed on a central part of the separation plate so that the metal material reaches the substrate through the hole, wherein the apparatus further comprises a vent(15) installed on the reaction chamber to form vacuum in the deposition chamber, wherein the target comprises a cover(12b) for covering the metal material, and a sputtering gas injection port(12c) for injecting sputtering gas between the target and the cover, and wherein the apparatus further comprises a reactive gas injection port installed on the reaction chamber to supply reactive gas so that the reactive gas is reacted with the metal material to form a metal oxide film on the substrate.
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