And a method of forming the structure including an adjustable anti-reflective coating.

摘要

It is to provide a method for forming the same structure and contain the present invention relates adjustable anti-reflective coating. Wiring structure in (BEOL) wiring process applications, including (TERA) coating [SOLUTION] tunable etch resistant anti-reflection is described. For example, TERA coating can be incorporated in a dual damascene structure, or a single damascene structure. The TERA coating can be useful as part of a lithographic mask for forming the interconnect structure, or can be, it will be as a hard mask, as a stop layer chemical mechanical polishing of (CMP), to serve as a sacrificial layer or during CMP . [Selection] Figure