And a method of manufacturing a sputtering target of a single multi-component material, method for producing a multi-component alloy nanostructured thin films using the same

摘要

[Challenge] The present invention a method of manufacturing the sputtering target and a single multi-component material, on multi-component alloy nanostructured thin film manufacturing method using the same. [MEANS FOR SOLVING PROBLEMS] The low or no high Solubility for the nitride formation gold element and nitride formation gold elements capable of nitride formation by the reaction with nitrogen, sputtering targets of a multi-component single bodies according to the invention, reaction or do not react with the nitrogen those containing an amorphous forming alloy system which is partially crystallized amorphous or non-nitridation gold elements sex is low, the nitride forming gold elements Ti, Zr, Hf, V, Nb, Ta, Cr contains at least one element, said non-nitridation gold elements Mg, Ca, Sc, Ni, Cu, Y, Ag, In, Sn, La, Au, Pb it is selected Mo, W, Al, of Si It may be configured to include at least one element selected from the. [Selection Figure 7