The substrate central processing unit, substrate treatment manner, using the computer reading possible record media null treatment liquid which records the substrate treatment program,

摘要

PROBLEM TO BE SOLVED: To highly accurately supply a processing liquid of a predetermined flow rate and a predetermined concentration to a substrate processing section of a substrate processing apparatus.;SOLUTION: The substrate processing apparatus (1) has a structure in which a plurality of substrate processing portions (11-22) process a substrate (2) while using a processing liquid supplied from a processing liquid supply portion (24). The apparatus (1) sequentially carries the substrate (2) to each of the substrate processing portions (11-22), and when the flow rate of the processing liquid used by a single substrate processing portion (11-22) is smaller than the flow rate controllable by the processing liquid supply portion (24), a processing start time is controlled so that the substrates (2) are carried to the plurality of substrate processing portions (11-22) until the flow rate becomes controllable or above by the processing liquid supply portion (24) and then the processing liquid is simultaneously used by the plurality of substrate processing portions (11-22).;COPYRIGHT: (C)2010,JPO&INPIT