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The treatment section which treats the substrate the substrate central processing unit, making use of the record media null liquid medicine where the computer program in order to run substrate treatment

机译:处理部分对衬底进行处理的衬底中央处理单元,利用记录介质为空的药液在计算机程序中运行以便进行衬底处理

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of improving the treatment efficiency of a substrate by reducing the dissolved oxygen of a chemical, and improving reliability.;SOLUTION: This substrate treatment device 1 includes a treatment part 10 for treating a substrate W, a chemical storage container 20 for storing the chemical, a chemical supplying drive part 23 for supplying the chemical from the chemical storage container 20 to the treatment part 10, a circulation line 30 for circulating the chemical stored in the chemical storage container 20, and a mixture generation part 31 provided on the circulation line 30. An inert gas is supplied to the mixture generation part 31 by an inert gas supply source 40. The mixture generation part 31 mixes the chemical supplied from the chemical storage container 20 and the inert gas supplied from the inert gas supply source 40 to generate a gas-liquid mixture.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种基板处理装置,该基板处理装置能够通过减少化学物质的溶解氧来提高基板的处理效率,并提高可靠性。解决方案:该基板处理装置1包括用于处理基板的处理部10。 W,用于存储化学药品的化学药品存储容器20,用于将化学药品从化学药品存储容器20供应至处理部件10的化学药品供应驱动部23,用于使存储在化学药品存储容器20中的化学药品循环的循环管线30,惰性气体供给源40将惰性气体供给到混合物产生部31。混合物产生部31将从化学存储容器20供给的化学药品和惰性气体混合。从惰性气体供应源40供应的气体产生气液混合物。;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP5189121B2

    专利类型

  • 公开/公告日2013-04-24

    原文格式PDF

  • 申请/专利权人 東京エレクトロン株式会社;

    申请/专利号JP20100053048

  • 发明设计人 平 真 樹;

    申请日2010-03-10

  • 分类号H01L21/304;H01L21/027;H01L21/306;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:37

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