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METHODS OF FORMING STRUCTURES WITH A FOCUSED ION BEAM FOR USE IN ATOMIC FORCE PROBING AND STRUCTURES FOR USE IN ATOMIC FORCE PROBING
METHODS OF FORMING STRUCTURES WITH A FOCUSED ION BEAM FOR USE IN ATOMIC FORCE PROBING AND STRUCTURES FOR USE IN ATOMIC FORCE PROBING
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机译:用聚焦离子束形成用于原子力探测的结构的方法以及用于原子力探测的结构
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摘要
Methods for forming structures to use in atomic force probing of a conductive feature embedded in a dielectric layer and structures for use in atomic force probing. An insulator layer is formed on the dielectric layer such that the conductive feature is covered. A contact hole penetrates from a top surface of the insulator layer through the insulator layer to the conductive feature. The contact hole is at least partially filled with a conductive stud that is in electrical contact with the conductive feature and exposed at the top surface of the insulator layer so as to define a structure. A probe tip of an atomic force probe tool is landed on a portion of the structure and used to electrically characterize a device structure connected with the conductive feature.
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