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TUNNELING MAGNETORESISTANCE (TMR) READ SENSOR WITH LOW-CONTACT-RESISTANCE INTERFACES

机译:具有低接触电阻接口的隧道磁阻(TMR)读取传感器

摘要

The invention provides a TMR read sensor with low-contact-resistance metal/metal, metal/oxide and oxide/metal interfaces. The low-contact-resistance metal/metal interfaces in a reference or sense layer structure are in-situ formed in a high-vacuum deposition module of a sputtering system, without exposures to low vacuum in a transfer module and damages caused by a plasma treatment conducted in an etching module. The low-contact-resistance metal/oxide interface is formed by utilizing a thin Co—Fe—B reference layer and a thick Co—Fe reference layer to reduce boron diffusion and segregation caused by annealing. The low-contact-resistance oxide/metal interface is formed by replacing a Co—Fe—B sense layer with a Co-rich Co—Fe sense layer to eliminate boron diffusion and segregation caused by annealing. With the low-contact-resistance metal/metal, metal/oxide and oxide/metal interfaces, the TMR read sensor exhibits a junction resistance-area product of below 0.6 Ω-μm2, while maintaining a low ferromagnetic coupling field and a high TMR coefficient.
机译:本发明提供了一种具有低接触电阻的金属/金属,金属/氧化物和氧化物/金属界面的TMR读取传感器。在溅射系统的高真空沉积模块中原位形成参考层或感测层结构中的低接触电阻金属/金属界面,而不会在传输模块中暴露于低真空和等离子体处理引起的损坏在蚀刻模块中进行。通过利用薄的Co-Fe-B参考层和厚的Co-Fe参考层来形成低接触电阻金属/氧化物界面,以减少退火引起的硼扩散和偏析。通过用富含钴的Co-Fe感测层代替Co-Fe-B感测层来形成低接触电阻氧化物/金属界面,以消除由退火引起的硼扩散和偏析。在低接触电阻的金属/金属,金属/氧化物和氧化物/金属界面下,TMR读取传感器的结电阻面积积低于0.6Ω-μm 2 ,同时保持较低的电阻。铁磁耦合场和高TMR系数。

著录项

  • 公开/公告号US2012299132A1

    专利类型

  • 公开/公告日2012-11-29

    原文格式PDF

  • 申请/专利权人 TSANN LIN;

    申请/专利号US201113117922

  • 发明设计人 TSANN LIN;

    申请日2011-05-27

  • 分类号H01L29/82;H01L21/02;

  • 国家 US

  • 入库时间 2022-08-21 16:47:59

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