首页> 外国专利> Semiconductor device including cell region and peripheral region having high breakdown voltage structure

Semiconductor device including cell region and peripheral region having high breakdown voltage structure

机译:包括具有高击穿电压结构的单元区域和外围区域的半导体器件

摘要

A semiconductor device includes a semiconductor substrate and an electric field terminal part. The semiconductor substrate includes a substrate, a drift layer disposed on a surface of the substrate, and a base layer disposed on a surface of the drift layer. The semiconductor substrate is divided into a cell region in which a semiconductor element is disposed and a peripheral region that surrounds the cell region. The base region has a bottom face located on a same plane throughout the cell region and the peripheral region and provides an electric field relaxing layer located in the peripheral region. The electric field terminal part surrounds the cell region and a portion of the electric field relaxing layer and penetrates the electric field relaxing layer from a surface of the electric field relaxing layer to the drift layer.
机译:半导体装置包括半导体基板和电场端子部。半导体衬底包括衬底,设置在衬底的表面上的漂移层以及设置在漂移层的表面上的基层。半导体衬底被划分为其中布置有半导体元件的单元区域和围绕该单元区域的外围区域。基部区域具有在整个单元区域和外围区域中位于同一平面上的底面,并提供位于外围区域中的电场缓和层。电场端子部分围绕单元区域和电场缓和层的一部分,并且从电场缓和层的表面到漂移层穿透电场缓和层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号