首页> 外国专利> 2DEG Schottky diode formed in nitride material with a composite Schottky/ohmic electrode structure and method of making the same

2DEG Schottky diode formed in nitride material with a composite Schottky/ohmic electrode structure and method of making the same

机译:由具有复合肖特基/欧姆电极结构的氮化物材料形成的2DEG肖特基二极管及其制造方法

摘要

Disclosed is a semiconductor device including: a base substrate; a semiconductor layer disposed on the base substrate; an ohmic electrode part which has ohmic electrode lines disposed in a first direction, on the semiconductor layer; and a Schottky electrode part which is disposed to be spaced apart from the ohmic electrode lines on the semiconductor layer and includes Schottky electrode lines disposed in the first direction, wherein the Schottky electrode lines and the ohmic electrode lines are alternately disposed in parallel, and the ohmic electrode part further includes first ohmic electrodes covered by the Schottky electrode lines on the semiconductor layer.
机译:公开了一种半导体器件,包括:基底基板;和半导体层设置在基础基板上;欧姆电极部分,其在第一方向上在半导体层上具有欧姆电极线;肖特基电极部分,其与所述半导体层上的欧姆电极线间隔开地设置,并且包括沿第一方向设置的肖特基电极线,其中,所述肖特基电极线和所述欧姆电极线交替地平行设置,并且欧姆电极部分还包括被半导体层上的肖特基电极线覆盖的第一欧姆电极。

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