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Semiconductor integrated circuit device having improved punch-through resistance and production method thereof, semiconductor integrated circuit device including a low-voltage transistor and a high-voltage transistor

机译:具有改善的穿通电阻的半导体集成电路器件及其制造方法,包括低压晶体管和高压晶体管的半导体集成电路器件

摘要

An integrated circuit device comprises a memory cell well formed with a flash memory device, first and second well of opposite conductivity types for formation of high voltage transistors, and third and fourth wells of opposite conductivity types for low voltage transistors, wherein at least one of the first and second wells and at least one of the third and fourth wells have an impurity distribution profile steeper than the memory cell well.
机译:一种集成电路装置,包括:具有闪存装置的存储器单元阱;用于形成高压晶体管的具有相反导电类型的第一和第二阱;以及用于低压晶体管的具有相反导电类型的第三和第四阱,其中至少一个第一和第二阱以及第三和第四阱中的至少一个具有比存储单元阱陡峭的杂质分布轮廓。

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