首页> 外国专利> Transistor using derivative polymethyl-methacrylate thin film as gate insulator and passivation layer, and fabrication method thereof

Transistor using derivative polymethyl-methacrylate thin film as gate insulator and passivation layer, and fabrication method thereof

机译:使用衍生的聚甲基丙烯酸甲酯薄膜作为栅绝缘体和钝化层的晶体管及其制造方法

摘要

Disclosed are a transistor including a gate insulation layer and an organic passivation layer of a polymer thin film, and a fabrication method thereof. The transistor comprises a substrate, a gate electrode formed on the substrate, a gate insulation layer including a polymethacrylic acid thin film, formed on the gate electrode and the substrate, a channel layer formed on the gate insulation layer, source electrode and drain electrode formed on the channel layer so as to expose at least a part of the channel layer, and an organic passivation layer including a polymethacrylic acid thin film, formed on the source electrode, drain electrode and the partially exposed channel layer. The method for fabricating a transistor comprises steps of forming a gate electrode on a substrate, forming a gate insulation layer of a polymethacrylic acid thin film on the gate electrode and the substrate, forming a channel layer on the gate insulation layer, forming source electrode and drain electrode on the channel layer so as to expose at least a part of the channel layer, and forming an organic passivation layer of a polymethacrylic acid thin film on the source electrode, drain electrode and the partially exposed channel layer.
机译:公开了一种包括栅极绝缘层和聚合物薄膜的有机钝化层的晶体管及其制造方法。该晶体管包括衬底,形成在衬底上的栅电极,包括在栅电极和衬底上的包括聚甲基丙烯酸薄膜的栅绝缘层,形成在栅绝缘层上的沟道层,形成的源电极和漏电极在沟道层上形成至少一部分沟道层以暴露沟道层的至少一部分,并且在源极,漏极和部分暴露的沟道层上形成包括聚甲基丙烯酸薄膜的有机钝化层。该晶体管的制造方法包括以下步骤:在衬底上形成栅电极;在栅电极和衬底上形成聚甲基丙烯酸薄膜的栅绝缘层;在栅绝缘层上形成沟道层;形成源电极和在沟道层上形成漏极,以暴露出沟道层的至少一部分,并在源极,漏极和部分暴露的沟道层上形成聚甲基丙烯酸薄膜的有机钝化层。

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