首页> 外国专利> MEASURING HEAD SYSTEM FOR A COORDINATE MEASURING MACHINE AND METHOD FOR THE OPTICAL MEASUREMENT OF DISPLACEMENTS OF A SCANNING ELEMENT OF THE MEASURING HEAD SYSTEM

MEASURING HEAD SYSTEM FOR A COORDINATE MEASURING MACHINE AND METHOD FOR THE OPTICAL MEASUREMENT OF DISPLACEMENTS OF A SCANNING ELEMENT OF THE MEASURING HEAD SYSTEM

机译:坐标测量机的测量头系统和光学测量头系统扫描元件位移的方法

摘要

The invention relates to a measuring head system (1) for a coordinatemeasuring machine,having a scanning element (6), which has a part provided for contacting ameasured object as acontacting part (5), which can be moved in relation to a fixed measuring headbase (2) in a lateralx direction (20) and a lateral y direction (21), such that an object to bemeasured can bemechanically scanned using the scanning element (6). An optical sensor (10),having a sensor line(11) which can be read out and comprises a plurality of array sensor elements,is fixed on themeasuring head base (2). Furthermore, means are provided, which areparticularly disposedspatially fixed to the contacting part (5), generate a projection - as afunction of displacements ofthe contacting part (5) in relation to the measuring head base (2) - on thesensor line (11) using atleast one radiation source (15). In addition, an analysis unit is provided.The means have at leastone first mask element (17), which is implemented to generate a first partialprojection on thesensor line (11) such that said partial projection is optimized to determinean x displacement anda y displacement of the contacting part (5) in relation to the measuring headbase (2) in the xdirection or y direction. The analysis unit is configured to determine the xdisplacement and the ydisplacement from signals only generated by the one sensor line (11).
机译:本发明涉及一种用于坐标的测量头系统(1)。测量机具有扫描元件(6),该扫描元件的一部分用于接触被测物为接触部分(5),可以相对于固定的测量头移动侧面的底座(2)x方向(20)和横向y方向(21)测量可以使用扫描元件(6)进行机械扫描。光学传感器(10),有传感器线(11),其可以被读出并且包括多个阵列传感器元件,固定在测量头底座(2)。此外,提供了手段,这些手段是特别处置在空间上固定在接触部件(5)上,生成投影-位移函数相对于测量头底座(2)的接触部件(5)-传感器线(11)使用至少一个辐射源(15)。另外,提供了分析单元。手段至少一个第一掩模元件(17),其被实现为产生第一局部投影在传感器线(11),以便优化部分投影以确定x位移和接触部分(5)相对于测量头的y位移x的底数(2)方向或y方向。分析单元被配置为确定x位移和y仅由一根传感器线(11)产生的信号产生位移。

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