首页> 外国专利> NITRIDE SEMICONDUCTOR LIGHT-EMITTING CHIP, NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR CHIP

NITRIDE SEMICONDUCTOR LIGHT-EMITTING CHIP, NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR CHIP

机译:氮化物半导体发光芯片,氮化物半导体发光器件以及制造氮化物半导体芯片的方法

摘要

A nitride semiconductor light-emitting chip (100) is provided with: a conductive substrate (104) having a nitride semiconductor layer; an n-type nitride semiconductor layer (105), an active layer (106), and a p-type nitride semiconductor layer (107) formed sequentially on the primary surface of the nitride semiconductor layer; and an n-side electrode (109) provided so as to contact the conductive substrate. The conductive substrate has a plurality of recessed portions (104a) formed in mutually separated positions on a rear side that is on the opposite side of the primary side. The n-side electrode contacts at least some of the front side of the recessed portions (104a). D1≤0.25T, where T is the thickness of the conductive substrate and D1 is the depth of the recessed portions.
机译:氮化物半导体发光芯片(100)具备:具有氮化物半导体层的导电性基板(104);以及具有导电性的基板(104)。在该氮化物半导体层的主面上依次形成的n型氮化物半导体层(105),活性层(106)和p型氮化物半导体层(107)。设置有与导电性基板接触的n侧电极(109)。导电性基板在与一次侧相反的一侧的背面侧的相互分离的位置上形成有多个凹部(104a)。 n侧电极接触凹部(104a)的前侧中的至少一些。 D1≤0.25T,其中T是导电基板的厚度,D1是凹部的深度。

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