首页> 外国专利> THIN FILM TRANSISTOR SUBSTRATE AND METHO OF MANUFACTURING THE SAME AND MASK FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE

THIN FILM TRANSISTOR SUBSTRATE AND METHO OF MANUFACTURING THE SAME AND MASK FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE

机译:薄膜晶体管基片及其制造方法和制造薄膜晶体管基片的方法

摘要

When the thin film transistor is turned off by minimizing the movement area of electrons between the source and drain electrodes of the thin film transistor, enlarging the moving distance of the electrons, and making the size of the capacitor formed by contacting the gate electrode with each of the source and drain electrodes Disclosed are a thin film transistor substrate capable of minimizing leakage current, a method of manufacturing the same, and a mask for manufacturing the thin film transistor substrate. This can minimize off current induced by the trapping of electrons by light.;Thin Film Transistors, Source Electrodes, Drain Electrodes, Off Current, Leakage Pass
机译:当通过最小化薄膜晶体管的源极和漏极之间的电子移动区域来关闭薄膜晶体管时,扩大电子的移动距离,并使通过使栅极电极与每个电极接触而形成的电容器的尺寸成为可能源电极和漏电极的一部分公开了一种能够使漏电流最小的薄膜晶体管基板,其制造方法以及用于制造该薄膜晶体管基板的掩模。这可以最小化由光捕获电子引起的截止电流。;薄膜晶体管,源电极,漏电极,截止电流,漏通

著录项

  • 公开/公告号KR101211086B1

    专利类型

  • 公开/公告日2012-12-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060012147

  • 发明设计人 임도기;이종환;이용우;김용조;

    申请日2006-02-08

  • 分类号H01L29/786;

  • 国家 KR

  • 入库时间 2022-08-21 16:28:06

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