METHOD FOR MANUFACTURING A NANOWIRE WHICH IS ABLE TO ADJUST THE WIDTH AND HEIGHT OF THE NANOWIRE BY CONTROLLING TIME FOR A WET-ETCHING PROCESS

摘要

PURPOSE: A method for manufacturing a nanowire is provided to produce a large amount of high uniformity nanowire through a wet-etching process.;CONSTITUTION: A method for manufacturing a nanowire comprises: a step of forming a plurality of lattice patterns(131) on a substrate(110); a step of forming a sacrificial layer(140) on the lattice patterns; a step of forming a nanowire(170) on the lattice patterns with the sacrificial layer; and a step of etching the sacrificial layer and separating the lattice pattern and the nanowire.;COPYRIGHT KIPO 2013