PURPOSE: An instrumentation system using an alignment system and a location measuring method are provided to accurately measure the location and posture of an object according to the location of each alignment system and the location of an alignment mark measured by the alignment system.;CONSTITUTION: A reference mark array with a plurality of reference marks is mounted on a movable table(100). The plurality of reference marks are measured by using an alignment system(140). The location of the alignment system is obtained by transferring the movable table. Image information about a working object(W) is obtained by using the alignment system. The location of an alignment mark is obtained by using the image information, the location of the alignment system, and the location of the movable table. The location and posture of the working object are measured by using the obtained alignment mark.;COPYRIGHT KIPO 2013
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