METHOD FOR FORMING A RESIST PATTERN WITH ENHANCED SENSITIVITY AND RESOLUTION PERFORMANCE AND A CROSSLINKING NEGATIVE RESIST COMPOSITION

摘要

PURPOSE: A method for forming a resist pattern, a crosslinking negative resist composition, a nanoimprint mold, and a photomask are provided to ensure high resolution and to improve resolution performance.;CONSTITUTION: A method for forming a resist pattern comprises: a step of forming a film using a negative resist composition; a step of exposing the film to light; and a step of developing the film using an alkaline developing solution. The thickness of the film is 15-40 nm. The alkaline developing solution contains 0.5-1.1 mass% of alkaline.;COPYRIGHT KIPO 2013