首页> 外国专利> DICING/DIE BONDING INTEGRAL FILM, DICING/DIE BONDING INTEGRAL FILM MANUFACTURING METHOD, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD

DICING/DIE BONDING INTEGRAL FILM, DICING/DIE BONDING INTEGRAL FILM MANUFACTURING METHOD, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD

机译:切割/管芯键合集成膜,切割/管芯键合集成膜制造方法以及半导体芯片制造方法

摘要

A dicing/die bonding integral film of the present invention includes a base film, a pressure-sensitive adhesive layer which is formed on the base film and to which a wafer ring for blade dicing is bonded, and a bonding layer formed on the adhesive layer and having a central portion to which a semiconductor wafer to be diced is bonded, wherein a planar shape of the bonding layer is circular, an area of the bonding layer is greater than an area of the semiconductor wafer and smaller than an area of each of the base film and the adhesive layer, and a diameter of the bonding layer is greater than a diameter of the semiconductor wafer and less than an inner diameter of the wafer ring, and a difference in diameter between the bonding layer and the semiconductor wafer is greater than 20 mm and less than 35 mm.
机译:本发明的切割/芯片接合一体膜包括:基膜;形成在该基膜上并结合有用于刀片切割的晶片环的压敏粘合剂层;以及形成在该粘合剂层上的粘合层。并具有接合有待切割的半导体晶片的中央部分,其中接合层的平面形状是圆形,接合层的面积大于半导体晶片的面积并且小于每个晶片的面积。所述基底膜和所述粘合剂层,并且所述结合层的直径大于所述半导体晶片的直径并且小于所述晶片环的内径,并且所述结合层和所述半导体晶片之间的直径差更大。小于20毫米且小于35毫米。

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