首页> 外国专利> MILLING DEVIATION MEASUREMENT METHOD AND DEVICE, SUITABLE FOR MEASURING RICE BRAN REMAINED IN RICE AND MEASURING THE MILLING DEVIATION BASED ON THE MEASURED RICE BRAN REMAINED IN RICE

MILLING DEVIATION MEASUREMENT METHOD AND DEVICE, SUITABLE FOR MEASURING RICE BRAN REMAINED IN RICE AND MEASURING THE MILLING DEVIATION BASED ON THE MEASURED RICE BRAN REMAINED IN RICE

机译:铣削偏差的测量方法和装置,适用于测量大米中残留的米糠,并基于大米中残留的所测量的米糠来测量铣削偏差

摘要

PURPOSE: A milling deviation measurement method and device are provided to measure a milling degree by measuring a color rice bran area rate index of a rice specimen without NMG reagent processing, thereby simply and rapidly measuring rice bran remained in the rice specimen.;CONSTITUTION: A milling deviation measurement device includes a transparent plate (110), a backlighting unit (220), ring lighting (210), an image acquisition unit (300), and an image processing unit (400). A milled rice specimen is placed on the transparent plate. The backlighting unit is arranged under the transparent plate and irradiates lights to the rice specimen placed on the transparent plate. The ring lighting is arranged above the transparent plate and irradiates lights to the rice specimen through a ring-shaped diffuser. The image acquisition unit acquires reflection images formed by the lights irradiated from the ring lighting and reflected by the rice specimen and transmission images formed by the lights irradiated from the backlighting unit and penetrated through the rice specimen. The image processing unit detects a residual rice bran region based on the reflection images and the transmission images acquired by the image acquisition unit, thereby calculating a color rice bran area rate (CBB) index after acquiring a pericarp region and an aleurone layer region.;COPYRIGHT KIPO 2013;[Reference numerals] (110) Transparent plate; (210) Ring lighting; (220) Backlighting unit; (300) Image acquisition unit; (400) Image processing unit; (AA) White rice
机译:目的:提供一种铣削偏差测量方法和装置,通过测量未经NMG试剂处理的大米标本的有色米糠面积率指数,从而简单,快速地测量大米标本中残留的米糠,从而测量碾米度。铣削偏差测量装置包括透明板(110),背光单元(220),环形照明(210),图像获取单元(300)和图像处理单元(400)。碾米样品放置在透明板上。背光单元布置在透明板下方,并且将光照射到放置在透明板上的大米样本。环形照明装置布置在透明板上方,并通过环形漫射体将光照射到大米样本上。图像获取单元获取由环形照明装置照射的并由大米标本反射的光形成的反射图像,以及由背光单元照射并穿透大米标本的光形成的透射图像。图像处理单元基于图像获取单元获取的反射图像和透射图像,检测残留的米糠区域,从而在获取果皮区域和糊粉层区域后,计算出彩色米糠面积率(CBB)指数。 COPYRIGHT KIPO 2013; [参考数字](110)透明板; (210)环形照明; (220)背光单元; (300)图像获取单元; (400)图像处理单元; (AA)白米饭

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号