首页> 外国专利> DOUBLE-SIDED POLISHER AND A DRESSER FOR A POLISHING PAD APPLIED TO THE SAME, CAPABLE OF EFFICIENTLY POLISHING A DOUBLE-SIDED POLISHING PAD

DOUBLE-SIDED POLISHER AND A DRESSER FOR A POLISHING PAD APPLIED TO THE SAME, CAPABLE OF EFFICIENTLY POLISHING A DOUBLE-SIDED POLISHING PAD

机译:双面抛光机和用于抛光垫的抛光粉应用于该抛光垫,可有效抛光双面抛光垫

摘要

PURPOSE: A double-sided polisher and a dresser for a polishing pad applied to the same are provided to properly implement polishing performance according to the kind and state of the polishing pad by varying the shape of a segment.;CONSTITUTION: A pair of tables (110,120) are rotatably installed to face each other. An inner gear (150) is rotatably formed on one center of the tables. An outer gear (160) is rotatably formed on one outer part of the tables. A pair of polishing pads (130,140) are attached to the tables to face each other and polish a wafer. A plurality of dressers (170) are installed in the diametric directions of the polishing pads to be fixed to the inner and outer gears. The dressers remove foreign materials from the surfaces of the polishing pads.;COPYRIGHT KIPO 2013
机译:目的:提供一种双面抛光机和用于其的抛光垫修整器,以通过改变扇形的形状来根据抛光垫的种类和状态适当地实现抛光性能。;构成:一对桌子(110,120)可旋转地安装为彼此面对。内齿轮(150)可旋转地形成在工作台的一个中心上。外齿轮(160)可旋转地形成在工作台的一个外部上。一对抛光垫(130,140)连接到工作台以彼此面对并抛光晶片。在抛光垫的直径方向上安装有多个修整器(170),以固定到内齿轮和外齿轮。修整器去除抛光垫表面的异物。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130079696A

    专利类型

  • 公开/公告日2013-07-11

    原文格式PDF

  • 申请/专利权人 LG SILTRON INCORPORATED;

    申请/专利号KR20120000332

  • 发明设计人 AN MI GAH;

    申请日2012-01-03

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 16:26:41

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