METHOD OF FABRICATING MASTER MOLD FOR LOW REFLECTION FILM AND MASTER MOLD FOR LOW REFLECTION FILM USING THE SAME

摘要

PURPOSE: there is a kind of low-reflection film of easily fabricated master mold described in the use of the stepped cone low-reflection film for the low-reflection film manufacturing master mold nanometer mode high-grade ratio by the fine relief shape for forming pattern not have light exposing process. ;CONSTITUTION: a kind of following steps manufacturing the main mould for low-reflection film: preparing substrate, wherein hard mask lamination (S100); Patterning hard mask layer is at least secondary (S200) using nanoimprint process; Patterned substrate utilizes patterned hard mask layer (S300); Etched features substrate and the direction (S400) for patterning the where effective refractive index upper substrate gradually changed with low reflective shape. ;The 2013 of copyright KIPO submissions;[Reference numerals] (S100) preparing substrate is laminated in hard mask; (S200) hard mask is carried out to utilize at least twice of nanoimprint process; (S300) patterned substrate patterned hard mask layer is carried out; (S400) carrying out patterned substrate, there is low reflective shape to pass through etching composition