SUSCEPTOR FOR A CHEMICAL VAPOR DEPOSITION DEVICE CAPABLE OF MANUFACTURING A HIGH-QUALITY SUBSTRATE AND A CHEMICAL VAPOR DEPOSITION DEVICE INCLUDING THE SAME

摘要

PURPOSE: A susceptor for a chemical vapor deposition device and a chemical vapor deposition device including the same improve the temperature uniformity of a substrate by preventing a temperature difference from occurring in the substrate laid on the susceptor.;CONSTITUTION: A rotor (110) rotates by the rotation of a rotary shaft. Pockets (120, 130) are formed on the upper side of the rotor. The pocket includes a concave part (122, 132) to separate a mounting part and the lower side of a substrate. The pocket placed at a position corresponding to the rotary shaft includes a convex part. The convex part protrudes from the position corresponding to the rotary shaft to deliver uniform heat to the substrate.;COPYRIGHT KIPO 2013