首页> 外国专利> THIN FILM CLUSTER, A THIN FILM PARTICLE, AND A MANUFACTURING METHOD THEREOF CAPABLE OF INCREASING PRODUCT QUALITY

THIN FILM CLUSTER, A THIN FILM PARTICLE, AND A MANUFACTURING METHOD THEREOF CAPABLE OF INCREASING PRODUCT QUALITY

机译:能够提高产品质量的薄膜团簇,薄膜颗粒及其制造方法

摘要

PURPOSE: A thin film cluster, a thin film particle, and a manufacturing method thereof are provided to manufacture fine particles and nano particles with a physical vapor deposition process.;CONSTITUTION: A manufacturing method of a thin film cluster and a thin film particle is as follows. A thin film layer (1) is partially deposited on a coated material (3). The coated material is formed while physical power is applied to the coated material to displace the coated material. At least one surface substrate of the coated material has a saturated vapor pressure of 100 torr or less at 25°C and a softening point of 650°C or less. The coated material at a time for coating the thin film layer is thicker than the thickness of the thin film layer and has a viscosity of 10 cps or more.;COPYRIGHT KIPO 2013
机译:目的:提供一种薄膜团簇,薄膜颗粒及其制造方法,以通过物理气相沉积工艺制备细颗粒和纳米颗粒。;构成:一种薄膜团簇和薄膜颗粒的制造方法为:如下。薄膜层(1)部分地沉积在涂覆材料(3)上。在将物理动力施加到涂覆材料以置换涂覆材料的同时形成涂覆材料。涂覆材料的至少一个表面基材在25℃下的饱和蒸气压为100托或更低,而软化点为650℃或更低。一次涂覆薄膜层的涂覆材料要比薄膜层的厚度厚,并且粘度为10 cps或更高。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130117335A

    专利类型

  • 公开/公告日2013-10-25

    原文格式PDF

  • 申请/专利权人 LEE HYEONG GON;

    申请/专利号KR20130040697

  • 发明设计人 LEE HYEONG GON;

    申请日2013-04-13

  • 分类号C23C14/00;C23C14/06;

  • 国家 KR

  • 入库时间 2022-08-21 16:26:01

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