首页> 外国专利> LANTHANUM OXIDE-BASED SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING LANTHANUM OXIDE-BASED SINTERED OBJECT, AND PROCESS FOR SPUTTERING TARGET PRODUCTION USING THE PROCESS

LANTHANUM OXIDE-BASED SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING LANTHANUM OXIDE-BASED SINTERED OBJECT, AND PROCESS FOR SPUTTERING TARGET PRODUCTION USING THE PROCESS

机译:基于氧化镧的烧结物体,包括烧结物体的溅射目标,生产基于氧化镧的烧结物体的过程以及使用该过程溅射目标产品的过程

摘要

as-sintered body according to The basic components of lanthanum oxide, titanium oxide, zirconium oxide, hafnium oxide of 1 or 2 contain not less than, and the balance of lanthanum oxide and lanthanum oxide-based sintered compact of unavoidable impurities. Lanthanum oxide powder as raw material, La 2 (CO 3 ) 3 powder or La 2 O 3 powder, TiO oxide added as a 2 , ZrO 2 , HfO 2 with 1 or 2 or more of the powder, metal in terms of, and the composition ratio of metal components of the mixed oxide was added in combination so that the predetermined value, the composite is heated in air, and the mixed powder, and then pulverized into a powder and then this composite material, the composite powder is hot method of producing a lanthanum oxide-based sintered body in a press to sinter. The present invention, prevents moisture or carbon dioxide gas, and that combined with the change in the powder to form a hydroxide or the like, and to enable long term storage. In addition, by film formation using this sputtering target, High-k gate oxide for the insulating film effectively also provides a technique that can provide a stable.
机译:氧化镧,氧化钛,氧化锆,氧化ha的基本成分为1或2,且含有不低于不可避免的杂质的氧化镧和氧化镧系烧结体。以氧化镧粉末为原料,La 2 (CO 3 3 粉末或La 2 O 3 粉末,以 2 形式添加的TiO氧化物,ZrO 2 ,HfO 2 和1或2种或更多粉末,就混合金属而言,混合氧化物的金属成分的组成比以预定值组合加入,在空气中加热该复合材料,然后将混合的粉末粉碎成粉末,然后将该复合材料粉碎,该复合粉末是热压法中以烧结法制造氧化镧系烧结体的方法。本发明防止湿气或二氧化碳气体以及与粉尘的变化结合而形成氢氧化物等,并能够长期保存。另外,通过使用该溅射靶进行成膜,还可以有效地提供用于绝缘膜的High-k栅氧化层提供稳定的技术。

著录项

  • 公开/公告号KR101222789B1

    专利类型

  • 公开/公告日2013-01-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20117000153

  • 申请日2009-06-23

  • 分类号C04B35/50;C23C14/34;C04B35/00;

  • 国家 KR

  • 入库时间 2022-08-21 16:25:52

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