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Method of forming nanopore with self-limited size by atomic layer deposition
Method of forming nanopore with self-limited size by atomic layer deposition
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机译:通过原子层沉积形成具有自限尺寸的纳米孔的方法
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摘要
The preparation of nano- pores are provided with a limited size by atomic layer deposition . Method of manufacturing nano- pores according to an embodiment of the present invention includes forming an opening in the membrane ; And forming a nano- pores formed from the precursor film cover using atomic layer deposition (ALD) on a side wall of the opening; includes , size of the nano- pores are characterized in that they have to be controlled by the size of the precursor . ; 展开▼