Composition for patterning on thermostable transparent insulator thin film and patterning method of thin film

摘要

PURPOSE: A composition for a thin film pattern of a heat resistance transparent insulated body, and a fabricating method of the thin film pattern using thereof are provided to reduce the process cost by simplify the process, and to secure the environment-friendly property. CONSTITUTION: A composition for a thin film pattern of a heat resistance transparent insulated body contains the following: a first oligomer obtained by hydrolysis polymerizing silane marked with R-CH2CH2CH2 Si(OR')3; a photo initiator generating a free radical by the radiation of an ultraviolet ray with the wavelength over 365 nanometers; at least one element selected from the group consisting a monomer with more than two unsaturated bonds in one molecule, or a second oligomer.