首页> 外文期刊>Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology >Electrical and structural properties of Bi2Te3 and Sb2Te3 thin films grown by the nanoalloying method with different deposition patterns and compositions
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Electrical and structural properties of Bi2Te3 and Sb2Te3 thin films grown by the nanoalloying method with different deposition patterns and compositions

机译:通过纳米合金化方法制备的Bi2Te3和Sb2Te3薄膜的电学和结构特性具有不同的沉积模式和组成

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摘要

Thin films of Bi2Te3 and Sb2Te3 were synthesized by the nanoalloying approach, which has recently been proven to yield V-VI compounds with good thermoelectric properties and has several advantages over "conventional" growth on hot substrates. Firstly, repeating layers of the elements Bi, Sb and Te with a thickness in the range between 0.2 nm and 2.4 nm were deposited on BaF2 (111) substrates in an MBE system at room temperature with different deposition patterns for different samples, i.e. in bilayer and quintuple stacks, with different starting layer thicknesses and different Te contents. Subsequently, the element layer stacks were annealed in order to induce crystallization and compound formation of Bi2Te3 and Sb2Te3 thin films. The annealed thin films were characterized using X-ray diffractometry (XRD), scanning electron microscopy (SEM), and energy dispersive spectroscopy (EDS). The transport properties, i.e. electrical conductivities, carrier concentrations, carrier mobilities, Seebeck coefficients and thermal conductivities, were determined at room temperature for several sets of starting layer thicknesses and deposition patterns depending on the Te content. The texture was found to be strongly influenced by the starting thicknesses of the elemental layers in the deposition pattern. Results of temperature dependent measurements of the Seebeck coefficient and electrical conductivity on one sample of nanoalloyed Bi2Te3 and Sb2Te3 together with results from temperature dependent in situ XRD investigations are presented.
机译:Bi2Te3和Sb2Te3薄膜是通过纳米合金方法合成的,最近被证明可以生产具有良好热电性能的V-VI化合物,并且在热基板上具有“常规”生长的优点。首先,在室温下,MBE系统中BaF2(111)衬底上的元素Bi,Sb和Te的重复层厚度为0.2 nm至2.4 nm,并具有不同的沉积模式,适用于不同的样品,即双层和五元组堆叠,具有不同的起始层厚度和不同的Te含量。随后,将元素层堆叠退火以诱导Bi 2 Te 3和Sb 2 Te 3薄膜的结晶和化合物形成。使用X射线衍射(XRD),扫描电子显微镜(SEM)和能量色散光谱(EDS)对退火的薄膜进行表征。在室温下,根据Te的含量,确定了几组起始层厚度和沉积模式的传输性能,即电导率,载流子浓度,载流子迁移率,塞贝克系数和热导率。发现纹理受到沉积图案中元素层的起始厚度的强烈影响。给出了一个纳米合金Bi2Te3和Sb2Te3样品的塞贝克系数和电导率的温度依赖性测量结果,以及温度依赖性原位XRD研究的结果。

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