(A) to general formula (I) with hydrogen of the phenolic hydroxyl group represented by a substituted atom polymer having the structure , (B) an actinic ray or a compound which generates an acid by irradiation of radiation , and a chemically amplified resist film formed using the resist composition containing an organic solvent , the resist film with a thickness of 10~200nm membrane . [In the formula , R 1 represents a hydrocarbon . R 2 represents a hydrogen atom or a hydrocarbon . Ar represents an aryl group . R 1 is may further contain a hetero atom and may form a good bond and Ar ring . * Represents the bonding position of the oxygen atom of the phenolic hydroxyl group ]
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机译：（A）至通式（I），其具有由具有结构的取代原子聚合物表示的酚羟基的氢，（B）光化射线或通过辐射线照射产生酸的化合物，以及化学放大的抗蚀剂膜用含有有机溶剂的抗蚀剂组合物形成的抗蚀剂膜，膜厚10〜200nm。 [式中，R 1 表示烃。 R 2 表示氢原子或烃。 Ar表示芳基。 R 1 可以进一步包含杂原子并且可以形成良好的键与Ar环。 *表示酚羟基的氧原子的键合位置]
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