Device for adjusting position of e.g. optical device for projection exposure system for extreme UV projection lithography, has holder unit whose dimension is variable by effect of magnetic field in predetermined direction

摘要

The device (26) has a holder unit (27) for supporting optical components (25, 30), and a generating unit (33) for generating magnetic field in a predetermine direction for amplitude distribution in a region of the holder unit. Dimension of the holder unit is variable around a certain amount by the effect of the magnetic field in the predetermined direction. The generating unit is arranged for the creation of the magnetic field, where the magnetic field is aligned in sections parallel to a halt prop (29) of the holder unit. Independent claims are also included for the following: (1) a method for adjusting a position of a component (2) a method for manufacturing a microstructured component.