SEMICONDUCTOR WAFER PROCESSING APPARATUS AND STATIC ELIMINATION SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a device for ensuring a sufficient static elimination time while replacing the atmosphere in FOUP, and improving particle adhesion due to an air flow that flows in when a door and a replacement chamber retreat from a sample transport route, and to provide a device for limiting the number of times of maintenance and informing a host device of a maintenance time.;SOLUTION: A semiconductor wafer processing apparatus for transferring a sample from a sample housing container including a lid for use in transfer of a sample includes a door for opening and closing the lid of the sample housing container, and a replacement chamber covering the opening and closing region of the door. The replacement chamber includes a purge port, an exhaust port, and a static eliminator, the door holds the lid of the sample housing container and retreats from a sample transport route, and the static eliminator performs static elimination of the sample.;COPYRIGHT: (C)2014,JPO&INPIT