A method of forming a ZnO film using the manufacturing method and the ZnO deposition material of the ZnO deposition material

摘要

PROBLEM TO BE SOLVED: To provide a ZnO vapor deposition material that can prevent splash from occurring when a ZnO film is formed.;SOLUTION: The ZnO vapor deposition material is formed of a porous sintered compact of a metal oxide. The sintered compact has a porosity of 0.2% or more but less than 3.0%, thereby significantly reducing an amount of gas remaining therein. The sintered compact has an average air hole diameter of 0.1-300 μm to cause an increase in vapor rate, thus reducing manufacturing cost. The ZnO film is formed by using the ZnO vapor deposition material.;COPYRIGHT: (C)2013,JPO&INPIT