Deposition of GaN thin film on ZnO/Si by DIBD method

摘要

The GaN thin film is successfully grown on the sample of ZnO/Si by dual ion beams deposition (DIBD) system.The thin film GaN/ZnO/Si is characterized by the in-situ X-ray photoelectron spectroscopy (XPS).It is shown that after a thin GaN film grown on the Zn/Si,the peaks of the Zn and O are not observed.This indicates that the GaN film can be successfully grown on the ZnO/Si by the dual ion beam deposition (DIBD) system associated with the pulsed laser deposition (PLD) method.