首页> 外国专利> Adsorption state determination method of a substrate and electrostatic chucking device

Adsorption state determination method of a substrate and electrostatic chucking device

机译:基板的吸附状态确定方法及静电吸附装置

摘要

Can grasp adsorption state of the substrate quickly and accurately the electrostatic chuck device which has the adsorption distinction means which is offered, in addition, can grasp adsorption state of the substrate with the electrostatic chuck device quickly and accurately adsorption state distinction manner of the substrate which is offered. It is the electrostatic chuck device which has the electrostatic chuck which makes the substrate adsorb on surface side of the metal infrastructure it is the electrostatic chuck device which features that adsorption distinction means in order to distinguish the adsorption state of the substrate are had in addition, being the manner which distinguishes the adsorption state of the substrate in the electrostatic chuck device which has the electrostatic chuck which makes the substrate adsorb on surface side of the metal infrastructure, through the electrostatic chuck, obtaining the flow of heat from the substrate which is transmitted with the heat flux sensor, it is adsorption state distinction manner of the substrate which features that it distinguishes the adsorption state of the substrate.
机译:具有所提供的吸附识别手段的静电吸盘装置,能够迅速且准确地掌握基板的吸附状态,另外,能够利用静电吸盘装置迅速且准确地掌握基板的吸附状态,从而能够掌握基板的吸附状态。提供。该静电吸盘装置具有静电吸附装置,该静电吸盘装置具有使基板吸附在金属基础结构的表面侧上的静电吸盘装置,其特征在于,该静电吸盘装置具有用于识别基板的吸附状态的吸附识别单元,在具有静电吸盘的静电吸盘装置中,通过使静电吸盘使基板吸附在金属基础结构的表面侧上,是通过静电吸盘来区分基板的吸附状态的方式,该热量从被传递的基板中获取。对于热通量传感器,其特征在于,是基板的吸附状态区分方式,其区别在于基板的吸附状态。

著录项

  • 公开/公告号JP5387921B2

    专利类型

  • 公开/公告日2014-01-15

    原文格式PDF

  • 申请/专利号JP20100527756

  • 发明设计人 藤澤 博;

    申请日2009-08-26

  • 分类号H01L21/683;H02N13/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:13:54

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号